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熱塑性聚酯及其應用

為了解決三氧化二銻的問題，作者魏家瑞 等 編著 這樣論述：

熱塑性聚酯是近幾年發展迅速的一個樹脂品種。本書簡要介紹了PET的生產，重點介紹了PET的結構、性能及其在不同制品中的應用。最後介紹了一些新型聚酯產品（PBT、PTT、PCT、PEN）的性能與應用及熱塑性聚酯生產與使用中的安全與環保要求。本書可供從事熱塑性聚酯生產及聚酯產品生產的技術人員使用。 第1章 緒言 1.1 熱塑性聚酯的發展歷史 1.2 熱塑性聚酯的特性 1.2.1 結構特點 1.2.2 性能 1.3 熱塑性聚酯的種類及應用 1.3.1 聚對苯二甲酸乙二醇酯 1.3.2 聚對苯二甲酸丁二醇酯 1.3.3 聚對苯二甲酸丙二醇酯 1.3.4

聚對苯二甲酸1，4.環己烷二甲醇酯 1.3.5 聚2，6.（�奈）二甲酸乙二醇酯 1.3.6 聚酯新品種 參考文獻 第2章 PET的制造 2.1 引言 2.2 原料和催化劑 2.2.1 對苯二甲酸二甲酯 2.2.2 對苯二甲酸 2.2.3 間苯二甲酸 2.2.4 乙二醇 2.2.5 乙二醇銻、醋酸銻和三氧化二銻 2.3 聚合化學反應原理 2.3.1 酯交換反應機理 2.3.2 酯化反應機理 2.3.3 縮聚反應機理 2.3.4 聚酯合成中的副反應 2.4 聚合生產工藝與設備 2.4.1 熔融縮聚過程與設備 2.4.2 固相縮聚過程與

設備 2.4.3 聚酯工藝成套技術國產化 2.5 切粒與包裝 2.5.1 切粒工藝 2.5.2 切片的儲存和包裝 2.6 產品質量標準與控制 2.6.1 質量標準 2.6.2 最終產品質量的控制 2.7 產品指標分析與檢驗 2.7.1 特性黏度的測定 2.7.2 熔點的測定 2.7.3 二甘醇含量的測定 2.7.4 端羧基含量的測定 2.7.5 色度的測定 2.7.6 凝集粒子的測定 2.7.7 水分的測定 2.7.8 粉末和異狀切片含量的測定 2.7.9 灰分的測定 2.7.10 鐵含量的測定 2.8 生產技術的新進展

2.8.1 生產裝備和工藝 2.8.2 新型聚酯催化劑 2.8.3 添加劑 2.8.4 納米改性 參考文獻 第3章 PET的結構、性能及縴維應用 3.1 引言 3.2 結構與性能及其表征 3.2.1 分子量及其分布 3.2.2 熔體的流變行為 3.2.3 熱性能與熱穩定性 3.2.4 結晶和取向 3.3 共聚改性及應用 3.3.1 添加剛性組分的共聚酯品種 3.3.2 添加柔性組分的共聚酯品種 3.4 共混改性及應用 3.4.1 PET/PE共混改性 3.4.2 PET/PP共混改性 3.4.3 PET/PEN共混改性 3.4.4

PET/PBT共混改性 3.4.5 PET/PA共混改性 3.4.6 PET/PC共混改性 3.4.7 其他一些共混改性 3.5 PET的縴維應用 3.5.1 滌綸縴維的分類 3.5.2 滌綸縴維的生產 3.5.3 滌綸縴維的性能 3.5.4 滌綸縴維的改性 3.5.5 滌綸縴維的應用 參考文獻 第4章 PET的薄膜應用 4.1 引言 4.1.1 流延PET（APET） 4.1.2 吹塑PET 4.1.3 平面雙向拉伸PET（BOPET） 4.2 BOPET對原料的要求 4.2.1 抗粘母粒切片 4.2.2 基料 4.2.3 其

他功能性母粒 4.3 BOPET加工原理 4.3.1 擠出塑化及流變 4.3.2 結晶 4.3.3 取向 4.3.4 降解及回用 4.4 BOPET生產工藝 4.4.1 原料切片準備 4.4.2 熔融擠出 4.4.3 鑄片 4.4.4 縱向拉伸 4.4.5 橫向拉伸 4.4.6 薄膜後整理 4.5 BOPET生產設備 4.5.1 原料切片的分篩與輸送 4.5.2 金屬分離裝置 4.5.3 原料切片的配料及混合 4.5.4 切片干燥設備 4.5.5 擠出系統 4.5.6 鑄片系統 4.5.7 縱向拉伸設備 4.5.8

橫向拉伸設備 4.5.9 牽引收卷系統 4.5.10 分切機組 4.5.11 廢料回收 4.5.12 測厚系統 4.6 BOPET生產線的發展 4.6.1 直接拉膜工藝技術 4.6.2 大容量BOPET生產線 4.6.3 同步拉伸技術工業化 4.6.4 配套裝置新技術的應用 4.7 BOPET薄膜的性能 4.7.1 力學性能 4.7.2 光學性能 4.7.3 表面性能 4.7.4 電性能 4.7.5 化學穩定性 4.8 BOPET薄膜的改性 4.8.1 原料化學改性 4.8.2 表面處理改性 4.9 BOPET薄膜的應用

4.9.1 磁記錄帶基 4.9.2 電工絕緣膜 4.9.3 金屬化薄膜 4.9.4 包裝薄膜 4.9.5 繪圖薄膜 4.9.6 脫模用BOPET 4.9.7 其他應用 4.10 行業狀況 參考文獻 第5章 PET的瓶、片材、塑鋼帶及工程塑料應用 5.1 引言 5.2 瓶用PET 5.2.1 聚酯瓶對原料的要求 5.2.2 聚酯瓶加工原理與生產工藝 5.2.3 聚酯瓶性能 5.2.4 聚酯瓶應用 5.2.5 聚酯啤酒瓶 5.2.6 瓶用聚酯行業狀況 5.3 APET片材 5.3.1 APET片材對原料的要求 5.3.2 APET片

材加工原理與生產工藝 5.3.3 APET片材性能 5.3.4 APET片材應用 5.3.5 其他聚酯片材 5.4 PET塑鋼帶 5.4.1 PET塑鋼帶對原料的要求 5.4.2 PET塑鋼帶加工原理與生產工藝 5.4.3 PET塑鋼帶性能 5.4.4 PET塑鋼帶應用 5.4.5 PET土工格柵應用 5.5 PET工程塑料 5.5.1 結晶改性 5.5.2 增韌改性 5.5.3 增強改性 5.5.4 擴鏈增黏 5.5.5 阻燃改性 5.5.6 PET工程塑料 參考文獻 第6章 PBT的制造、性能及應用 6.1 引言 6.2 P

BT合成原理 6.2.1 酯化反應機理 6.2.2 縮聚反應機理 6.3 PBT工業化生產技術 6.3.1 原料及催化劑 6.3.2 PBT工藝路線簡介 6.3.3 連續直接酯化法工藝簡介 6.4 PBT的結構與性能 6.4.1 PBT的化學結構 6.4.2 PBT的物理結構 6.4.3 PBT的力學性能 6.5 PBT的共聚改性 6.6 PBT的共混改性 6.6.1 玻縴增強改性 6.6.2 無機礦物質填充改性 6.6.3 PBT/PET共混改性 6.6.4 PBT增韌改性 6.7 PBT生產狀況及應用 6.7.1 全球PBT樹脂

生產狀況 6.7.2 全球PBT需求 6.7.3 國內外PBT產品的主要牌號及應用 6.7.4 PBT加工工藝 6.8 PBT技術新進展 參考文獻 第7章 PTT的制造、性能及應用 7.1 引言 7.2 主要原料及其制備 7.2.1 丙烯醛水合法 7.2.2 環氧乙烷甲　化法 7.2.3 生物發酵法 7.3 PTT聚合化學反應原理 7.3.1 酯化反應 7.3.2 酯交換反應 7.3.3 縮聚反應 7.3.4 醚化反應 7.3.5 環化反應 7.3.6 熱降解與熱氧降解反應 7.4 PTT聚合生產工藝 7.4.1 間歇法生產PT

T 7.4.2 連續法生產PTT 7.4.3 PTT的固相縮聚 7.4.4 產品指標與分析檢驗 7.5 PTT的結構和性能 7.5.1 化學結構 7.5.2 物理結構 7.5.3 化學性能 7.5.4 物理性能 7.5.5 流變性能 7.6 PTT的共聚改性 7.7 PTT的共混改性 7.8 PTT的縴維應用 7.8.1 PTT縴維性能 7.8.2 PTT縴維加工 7.8.3 PTT縴維應用 7.9 PTT的塑料應用 參考文獻 第8章 PCT的制造、性能及應用 8.1 引言 8.2 原料與催化劑 8.2.1 CHDM基本性能

8.2.2 CHDM的制備 8.2.3 催化劑 8.3 PCT的制備過程及設備 8.3.1 PCT的制備過程 8.3.2 PCT的生產設備 8.4 PCT的結構性能 8.4.1 CHDM異構體結構對PCT性能的影響 8.4.2 PCT的力學性能和熱性能 8.4.3 PCT的耐化學品性和耐水解性 8.4.4 PCT的結晶性能 8.4.5 PCT的加工性能 8.5 PCT的共縮聚改性 8.5.1 PCTA共聚酯 8.5.2 PCTG共聚酯 8.5.3 PETG共聚酯 8.5.4 PCTN共聚酯 8.5.5 幾種改性共聚酯性能比較 8.6

PCT的共混改性 8.6.1 PCT與其他樹脂的共混 8.6.2 阻燃PCT的共混改性 8.6.3 抗沖擊PCT的共混改性 8.6.4 PCT的其他共混改性 8.6.5 PCT的添加劑共混改性 8.6.6 PCT共混改性產品的應用 8.7 PCT的應用 8.7.1 PCT樹脂 8.7.2 PCT縴維 8.8 PCT共聚酯的應用 8.8.1 PCTA共聚酯的應用 8.8.2 PCTG共聚酯的應用 8.8.3 PETG共聚酯的應用 8.9 新型聚酯PCCD 參考文獻 第9章 PEN的制造、性能及應用 9.1 引言 9.2 原料和催化劑

9.2.1 原料 9.2.2 催化劑 9.3 聚合化學反應原理 9.4 聚合生產工藝 9.4.1 低聚物和預聚體制備 9.4.2 熔融縮聚 9.4.3 固態縮聚 9.5 PEN的結構與性能 9.5.1 分子量及其分布 9.5.2 熔體的流變行為 9.5.3 熱性能與熱穩定性 9.5.4 PEN形態 9.5.5 化學穩定性 9.5.6 力學性能 9.5.7 光學性能 9.5.8 氣體阻隔性能 9.5.9 電性能 9.6 PEN的應用 9.6.1 薄膜 9.6.2 縴維 9.6.3 飲料瓶 9.6.4 化妝品與藥品瓶 9

.7 PEN的共聚和共混改性 9.8 PEN共聚酯和共混物的應用 9.9 生產技術的新進展 參考文獻 第10章 聚酯樹脂新品種 10.1 引言 10.2 聚乳酸 10.2.1 合成 10.2.2 性質 10.2.3 聚乳酸切片牌號和加工成型 10.2.4 降解性 10.2.5 應用與展望 10.3 聚己內酯 10.3.1 合成 10.3.2 性質 10.3.3 降解性 10.3.4 應用 10.4 聚丁二酸丁二醇酯 10.4.1 合成 10.4.2 性質 10.4.3 改性 10.4.4 應用 10.5 聚羥基脂肪酸酯

10.5.1 合成 10.5.2 性質 10.5.3 改性 10.5.4 應用 10.6 聚碳酸亞丙酯 10.6.1 合成 10.6.2 性質 10.6.3 應用 10.7 聚乙醇酸 10.7.1 合成 10.7.2 性質 10.7.3 應用 10.8 液晶聚酯 10.8.1 分子結構設計 10.8.2 合成方法 10.8.3 結構性能表征 10.8.4 共混改性 10.8.5 應用 參考文獻 第11章 熱塑性聚酯生產和使用的安全與環保 11.1 PET生產和使用的安全與環保 11.1.1 PET的原料毒性及使用安全 1

1.1.2 PET的毒性及使用安全 11.1.3 PET生產中的安全與防護 11.1.4 PET生產產生的污染及其治理 11.1.5 PET及其復合材料的循環利用 11.2 PBT生產和使用的安全與環保 11.2.1 PBT的原料毒性及使用安全 11.2.2 PBT的毒性及使用安全 11.2.3 PBT生產和加工中的安全與防護 11.2.4 PBT生產產生的污染及其治理 11.2.5 PBT及其復合材料的循環利用 11.3 PTT生產和使用的安全與環保 11.3.1 PTT的原料毒性及使用安全 11.3.2 PTT的毒性及使用安全 11.3.3

PTT生產和加工中的安全與防護 11.4 PEN生產和使用的安全與環保 11.4.1 PEN的原料毒性及使用安全 11.4.2 PEN的毒性及使用安全 11.4.3 PEN生產和加工中的安全與防護 11.4.4 PEN生產產生的污染及其治理 11.4.5 PEN及其復合材料的循環利用 11.5 聚乳酸生產和使用的安全與環保 11.5.1 聚乳酸生產和加工中的安全與防護 11.5.2 回收料和邊角料的循環利用 附錄 附錄一 熱塑性聚酯牌號表 附錄二 熱塑性聚酯主要加工應用廠商與關鍵加工設備制造商 附錄三 熱塑性聚酯用添加劑、催化劑的生產商

塑膠製造業勞工銻暴露評估IOSH95-A301

為了解決三氧化二銻的問題，作者蕭英德 這樣論述：

　　物研究顯示三氧化二銻(Sb2O3)對老鼠造成肺癌與心肺疾病，高濃度之氫化銻會造成中樞神經危害與溶血。ACGIH已對三氧化二銻毒性列為A2級，IARC將其列為2B級，歐盟亦將其列為第三類；另美國ACGIH之BEI委員會已決定發展銻之生物偵測指標，且鼓勵各國進行相關研究，因此，本研究進行塑膠製造業勞工銻暴露評估資料庫建立。研究結果顯示，三氧化二銻製造廠(A)、工程塑膠製造廠(B)、工程塑膠製造廠(C)、環氧樹脂廠(D)等各廠有直接接觸三氧化二銻勞工其暴露濃度平均值(標準差)分別為，5.31(5.88)、0.498(0.309)、0.453(0.793)、0.111(0.101) mg/m3

，A廠作業勞工普遍嚴重超過法規規定，B、C二廠整體平均暴露雖未超過法規的0.5 mg/m3，但都相當接近規定值。C廠另外有進行只有投料時間的採樣，整體平均為3.923(4.401) mg/m3，表示若以TWA做為勞工實際銻暴露情形有嚴重低估現象。另外將上述勞工單當天尿液計算平均值，A、B、C、D廠分別為313.7(437.4)、40.1(32.8)、14.7(7.3)、4.8(4.2) μg Sb/g cre.。將A、B、C三廠勞工以作業時間接觸三氧化二銻時間長短為序列對暴露濃度進行One-way ANOVA分析(p＝0.003)，表示作業時間內接觸三氧化二銻時間長短對全程暴露濃度有顯著影響。

鎂摻雜三氧化二銻作為生醫感測膜的研究

為了解決三氧化二銻的問題，作者陳冠霖 這樣論述：

指導教授推薦書............................................口試委員審定書............................................致謝 iii摘要 ivAbstract vTable of Contents viList of Figures xiiiChapter 1 - 1 -Introduction - 1 -1.1 Background - 1 -1.1.2 EIS structure working principle - 1 -1.1.1 The bac

kground and history of ISFET - 2 -1.1.3 The characteristic of Antimony trioxide - 3 -1.2 The motivation in this study - 4 -1.2.1 The Sb2O3 sensing film with RTA in O2 ambient - 4 -1.2.2 The motivation of Mg doped Sb2O3 sensing membrane - 5 -1.3 Thesis Organization - 6 -Chapter 2

- 12 -The Sb2O3 sensing membrane applied in EIS structure with RTA in O2 ambient. - 12 -2.1Introduction - 12 -2.2 Experimental - 13 -2.2.1 Sb2O3-EIS fabrication in O2 RTA treatment - 13 -2.2.2 Test solution preparation - 14 -2.3 Analysis of Physical Characteristic - 14 -2.3.1 XRD

of Sb2O3 sensing membrane after post-RTA treatment at various temperatures in O2 ambient for 30 sec. - 14 -2.3.2 XPS of Sb2O3 sensing membrane after post-RTA treatment at various temperatures in O2 ambient for 30 sec. - 15 -2.3.3 AFM of analysis for Sb2O3 sensing membrane. - 16 -2.3.4 Field

Emission Scanning Electron Microscope (FESEM) analysis for Sb2O3 sensing membrane in different RTA temperature - 16 -2.4 Analysis of Electrical Characteristic - 17 -2.4.1 Sensitivity of Sb2O3 sensing membrane in different RTA temperature - 17 -2.4.2 Hysteresis effect of Sb2O3 sensing membr

ane in different RTA temperature - 18 -2.4.3 Drift rate of Sb2O3 sensing membrane in different RTA temperature - 19 -2.5 The Effect of Sb2O3 sensing membrane in different ions solution - 20 -2.5.1 Test solutions preparation - 20 -2.5.2 The Sb2O3 sensing membrane tested in different ions

solution - 20 -2.6 Enzyme-immobilized membrane based on Sb2O3 EIS for urea detection - 21 -2.6.1 Enzyme immobilization with covalent bonding - 22 -2.6.2 Chemicals - 23 -2.6.3 The urea detection of enzyme- Sb2O3 EIS structure - 23 -2.7 Enzyme-immobilized membrane based on Sb2O3 EIS for

glucose detection - 24 -2.7.1 Enzyme immobilization with covalent bonding - 24 -2.7.2 Chemicals - 25 -2.7.3 The glucose detection of enzyme- Sb2O3 EIS structure - 25 -2.8 Enzyme-immobilized membrane based on Sb2O3 EIS for Creatinine detection - 26 -2.8.1 Enzyme immobilization with co

valent bonding - 26 -2.8.2 pCreatinine detection of enzyme- Sb2O3 EIS structure - 27 -2.9 Summary - 27 -Chapter 3 - 48 -The Sensor Performance of Mg-doping and Ti-doping Sensing Membrane Applied in EIS Structure. - 48 -3.1Introduction - 48 -3.2 Experimental - 49 -3.3 Analysis of

Physical Characteristic - 50 -3.3.1 XRD of Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane after post- RTA treatment at various temperatures in O2 ambient for 30 sec - 50 -3.3.2 XPS of Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane after post-RTA treatment in O2 ambient

- 51 -3.3.3 Atomic force microscope (AFM) of analysis for Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane - 54 -3.3.4 Field Emission Scanning Electron Microscope (FESEM) of analysis for Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane - 55 -3.3.5 Transmission Electron Micr

oscopy (TEM) of analysis for Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane after RF sputter in Ar:O2=20:5 gas ratio - 55 -3.4 Analysis of Electrical Characteristic - 56 -3.4.1 Sensitivity of Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane - 56 -3.4.2 Hysteresis Effect

of Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane - 58 -3.4.3 Drift Effect of Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane - 59 -3.5 The Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane tested in different ions solution - 60 -3.5.1 Test solutions preparation

- 60 -3.5.2 The Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 sensing membrane tested in different ions solution - 61 -3.6 Enzyme-immobilized membrane based on Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 (Urea, Glucose, Creatinine) - 62 -3.6.1 Chemicals - 64 -3.6.2 Enzyme immobilization with co

valent bonding - 65 -3.6.3 pUrea detection of Enzyme- Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 EIS structure - 66 -3.6.4 pGlucose detection of Enzyme- Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3 EIS structure - 66 -3.6.5 pCreatinine detection of Enzyme- Sb2O3, Ti-doped Sb2O3 and Mg-doped Sb2O3

EIS structure - 67 -3.7 Summary - 68 -Chapter 4 - 126 -The Comparison of Sb2O3 and Sb2O3/SiO2 Stacked Sensing Membrane Applied in EIS Structure. - 126 -4.1Introduction - 126 -4.2 Experimental - 127 -4.3 Analysis of Physical Characteristic - 128 -4.3.1 XRD of Sb2O3 and Sb2O3/SiO

2 sensing membrane after post- RTA treatment at various temperatures in O2 ambient for 30 sec - 128 -4.3.2 XPS of Sb2O3 and Sb2O3/SiO2 sensing membrane after post-RTA treatment in O2 ambient - 129 -4.3.3 Atomic force microscope (AFM) of analysis for Sb2O3 and Sb2O3/SiO2 sensing membrane - 1

30 -4.3.4 Field Emission Scanning Electron Microscope (FESEM) of analysis for Sb2O3 and Sb2O3/SiO2 sensing membrane - 130 -4.4 Analysis of Electrical Characteristic - 131 -4.4.1 Sensitivity of Sb2O3 and Sb2O3/SiO2 sensing membrane - 131 -4.4.2 Hysteresis Effect of Sb2O3 and Sb2O3/SiO2 sensi

ng membrane - 132 -4.4.3 Drift Effect of Sb2O3 and Sb2O3/SiO2 sensing membrane - 133 -4.5 The Sb2O3 and Sb2O3/SiO2 sensing membrane tested in different ions solution - 134 -4.5.1 Test solutions preparation - 134 -4.5.2 The Sb2O3 and Sb2O3/SiO2 sensing membrane tested in different ions so

lution - 134 -4.6 Enzyme-immobilized membrane based on Sb2O3 and Sb2O3/SiO2 - 136 -4.6.1 Chemicals - 138 -4.6.2 Enzyme immobilization with covalent bonding - 139 -4.6.3 pUrea detection of Enzyme- Sb2O3 and Sb2O3/SiO2 EIS structure - 140 -4.6.4 pGlucose detection of Enzyme- Sb2O3 and Sb2

O3/SiO2 EIS structure - 140 -4.6.5 pCreatinine detection of Enzyme- Sb2O3 and Sb2O3/SiO2 EIS structure - 141 -4.7 Summary - 141 -Chapter 5 - 176 -Conclusions and Future work - 176 -5.1 Conclusions - 176 -5.2 Future Work - 177 -Reference - 178 -List of FiguresFig. 1-1 The I

SFET stricture - 8 -Fig. 1-2 The EIS structure - 9 -Fig. 1-3 Sb2O3 - 10 -Fig. 1-4 RTA in O2 ambient - 11 -Fig. 2-1 The Sb2O3 EIS structure - 28 -Fig. 2-2 Experimental of the Sb2O3 EIS structure - 29 -Fig. 2-3 XRD of the Sb2O3 film after RF sputter in Ar:O2= 20:5 annealing at variou

s temperatures in O2 ambient for 30 sec - 29 -Fig. 2-4 XPS results of Sb2O3 film (a)O 1s, (b)Sb 3d after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 30 -Fig. 2-5 AFM of Sb2O3 film (a)As-dep (b)400oC (c)500oC (d)600oC surface after RF sputter in Ar:O2=

20:5 annealing at various temperatures in O2 ambient for 30 sec - 34 -Fig. 2-6 FESEM of Sb2O3 film surface on single crystalline silicon after RF sputter in Ar : O2= 20:5 annealing at various temperatures in O2 ambient(a)As-dep (b)Annealing at 500oC in O2 ambient - 35 -Fig. 2-7 The normalized

C-V curve of the Sb2O3 sensing membrane. - 37 -Fig. 2-8 The Sb2O3 sensing membrane with different RTA temperature in O2 ambient of sensitivity and linearity - 38 -Fig. 2-9 Hysteresis of Sb2O3 sensing membrane with various RTA temperatures in O2 ambient during the pH loop of 7→4→7→10→7 - 39

-Fig. 2-10 Drift voltage of Sb2O3 sensing membrane annealed with various temperature - 39 -Fig. 2-11 The Sb2O3 sensing membrane with different RTA temperature in O2 ambient of hysteresis and drift voltage - 40 -Fig. 2-12 The inset figure represents the Na+、K+ sensitivity and linearity for as-

dep and annealing 500oC. - 42 -Fig. 2-13 The different ion sensitivity of Sb2O3 sensing membrane annealed 500oC in O2 ambient and as-dep - 43 -Fig. 2-14 Enzyme immobilization steps - 44 -Fig. 2-15 pGlucose-responses of enzyme- immobilized Sb2O3 (a) the sample for as-dep, (b) the film was an

nealed at 500oC in O2 ambient - 45 -Fig. 2-16 pUrea-responses of enzyme- immobilized Sb2O3 (a) the sample for as-dep, (b) the film was annealed at 500oC in O2 ambient - 46 -Fig. 2-16 pUrea-responses of enzyme- immobilized Sb2O3 (a) the sample for as-dep, (b) the film was annealed at 500oC in O

2 ambient - 47 -Fig. 3 - 1 The process flow of EIS structure - 69 -Fig. 3-2 Experiment detail - 70 -Fig. 3-3 XRD of the (a)Sb2O3 (b)Ti doped Sb2O3 (c)Mg doped Sb2O3 film after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 72 -Fig. 3-4 XPS results

of Sb2O3 film (a)Sb 3d, (b)O 1s after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 73 -Fig. 3-5 XPS results of Ti doped Sb2O3 film (a)Sb 3d, (b)Ti 2p, (c)O 1s after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec -

75 -Fig. 3-6 XPS results of Mg doped Sb2O3 film (a)Sb 3d, (b)Mg 2p, (d)O 1s after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 77 -Fig. 3-7 AFM of Sb2O3 film (a)As-dep (b)400oC (c)500oC (d)600oC surface after RF sputter in Ar:O2= 20:5 annealing at various

temperatures in O2 ambient for 30 sec - 81 -Fig. 3-8 AFM of Ti doped Sb2O3 film (a)As-dep (b)400oC (c)500oC (d)600oC surface after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 85 -Fig. 3-9 AFM of Mg doped Sb2O3 film (a)As-dep (b)400oC (c)500oC (d)600o

C surface after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 89 -Fig. 3-10 FESEM of Sb2O3 films surface on single crystalline silicon annealed at various temperatures in O2 ambient - 90 -Fig. 3-11 FESEM of Ti-doped Sb2O3 films surface on single crystal

line silicon annealed at various temperatures in O2 ambient - 91 -Fig. 3-12 FESEM of Mg-doped Sb2O3 films surface on single crystalline silicon annealed at various temperatures in O2 ambient - 92 -Fig. 3-13 EDX of Ti-doped Sb2O3 film surface after RF sputter in Ar:O2= 20:5 As-dep - 93 -Fig.

3-14 EDX of Mg-doped Sb2O3 film surface after RF sputter in Ar:O2= 20:5 As-dep - 93 -Fig. 3-15 EDX of Mg-doped Sb2O3 film surface after RF sputter in Ar:O2= 20:5 annealing at 400oC in O2 ambient for 30 sec - 94 -Fig. 3-16 TEM of Ti-doped Sb2O3 film surface after RF sputter in Ar:O2= 20:5 As-d

ep - 95 -Fig. 3-17 TEM of Mg-doped Sb2O3 film surface after RF sputter in Ar:O2= 20:5 As-dep - 95 -Fig. 3-18 TEM of Mg-doped Sb2O3 film surface after RF sputter in Ar:O2= 20:5 annealing at 400oC in O2 ambient for 30 sec - 96 -Fig. 3-19 The normalized C-V curve of the Sb2O3 sensing membrane

(a-d) after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec, the inset figure represents the sensitivity and linearity - 99 -Fig. 3-20 The normalized C-V curve of the Ti-doped Sb2O3 sensing membrane (a-d) after RF sputter in Ar:O2= 20:5 annealing at various te

mperatures in O2 ambient for 30 sec, the inset figure represents the sensitivity and linearity - 102 -Fig. 3-21 The normalized C-V curve of the Mg-doped Sb2O3 sensing membrane (a-c) after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec, the inset figure repres

ents the sensitivity and linearity - 104 -Fig. 3-22 Hysteresis of Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient during the pH loop of 7→4→7→10→7 over a period of 25 minutes - 105 -Fig. 3-23 Hysteresis of Ti-doped Sb2O3 sensing membrane a

fter RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient during the pH loop of 7→4→7→10→7 over a period of 25 minutes - 105 -Fig. 3-24 Hysteresis of Mg-doped Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient during the pH

loop of 7→4→7→10→7 over a period of 25 minutes - 106 -Fig. 3-25 Drift voltage of Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient, then dipped in pH 7 buffer solution for 12 hours - 106 -Fig. 3-26 Drift voltage of Ti-doped Sb2O3 sensing mem

brane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient, then dipped in pH 7 buffer solution for 12 hours - 107 -Fig. 3-27 Drift voltage of Mg-doped Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient, then dipped in

pH 7 buffer solution for 12 hours - 107 -Fig. 3-28 Hysteresis voltage and Drift voltage of Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient - 108 -Fig. 3-30 Hysteresis voltage and Drift voltage of Mg-doped Sb2O3 sensing membrane after RF s

putter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient - 109 -Fig. 3-31 The inset figure represents the Na+ sensitivity and linearity for Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient - 110 -Fig. 3-32 The inset figure repr

esents the Na+ sensitivity and linearity for Ti-doped Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient - 111 -Fig. 3-33 The inset figure represents the Na+ sensitivity and linearity for Mg-doped Sb2O3 sensing membrane after RF sputter in Ar:O2

= 20:5 annealing at various temperatures in O2 ambient - 112 -Fig. 3-34 The inset figure represents the K+ sensitivity and linearity for Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient - 113 -Fig. 3-35 The inset figure represents the K+ se

nsitivity and linearity for Ti-doped Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient - 114 -Fig. 3-36 The inset figure represents the K+ sensitivity and linearity for Mg-doped Sb2O3 sensing membrane after RF sputter in Ar:O2= 20:5 annealing a

t various temperatures in O2 ambient - 115 -Fig. 3-37 Enzyme immobilization steps - 116 -Fig. 3-38 pUrea-responses of enzyme- immobilized - 119 -Fig. 3-39 pGlucose-responses of enzyme- immobilized - 122 -Fig. 3-40 pCreatinine-responses of enzyme- immobilized - 125 -Fig. 4-1 The Sb2O3/

SiO2 EIS structure - 142 -Fig. 4-2 Experimental of the Sb2O3/SiO2 EIS structure - 142 -Fig. 4-3 XRD of the (a) Sb2O3 and (b) Sb2O3/SiO2 film after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 143 -Fig. 4-4 XPS results of Sb2O3 film (a)O 1s, (b)Sb 3d

after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 144 -Fig. 4-5 XPS results of Sb2O3/SiO2 film (a)O 1s, (b)Sb 3d after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 145 -Fig. 4-6 AFM of Sb2O3 film (a)As-dep (b

)400oC (c)500oC (d)600oC surface after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 sec - 149 -Fig. 4-7 AFM of Sb2O3/SiO2 film (a)As-dep (b)400oC (c)500oC (d)600oC surface after RF sputter in Ar:O2= 20:5 annealing at various temperatures in O2 ambient for 30 se

c - 153 -Fig. 4-8 FESEM of Sb2O3 film surface on single crystalline silicon after RF sputter in Ar : O2= 20:5 annealing at various temperatures in O2 ambient - 154 -Fig. 4-9 FESEM of Sb2O3/SiO2 film surface on single crystalline silicon after RF sputter in Ar : O2= 20:5 annealing at various te

mperatures in O2 ambient - 155 -Fig. 4-10 The normalized C-V curve of the Sb2O3 sensing membrane.. - 157 -Fig. 4-11 The normalized C-V curve of the Sb2O3/SiO2 sensing membrane. - 159 -Fig. 4-12 The Sb2O3 sensing membrane with different RTA temperature in O2 ambient of sensitivity and linear

ity - 160 -Fig. 4-13 The Sb2O3/SiO2 sensing membrane with different RTA temperature in O2 ambient of sensitivity and linearity - 160 -Fig. 4-14 Hysteresis of Sb2O3 sensing membrane with various RTA temperatures in O2 ambient during the pH loop of 7→4→7→10→7 - 161 -Fig. 4-15 Hysteresis of Sb

2O3/SiO2 sensing membrane with various RTA - 161 -temperatures in O2 ambient during the pH loop of 7→4→7→10→7 - 161 -Fig. 4-16 Drift voltage of Sb2O3 sensing membrane annealed with various - 162 -RTA temperatures in O2 ambient, then dipped in pH 7 buffer solution - 162 -for 12 hours -

162 -Fig. 4-17 Drift voltage of Sb2O3/SiO2 sensing membrane annealed with various RTA temperatures in O2 ambient, then dipped in pH 7 buffer solution for 12 hours - 162 -Fig. 4-18 The Sb2O3 sensing membrane with different RTA temperature in O2 ambient of hysteresis and drift voltage - 163 -Fi

g. 4-19 The Sb2O3/SiO2 sensing membrane with different RTA temperature in O2 ambient of hysteresis and drift voltage - 163 -Fig. 4-20 The Sb2O3 film inset figure represents the Na+、K+ sensitivity and linearity for as-dep and annealed 500oC in O2 ambient. - 165 -Fig. 4-21 The Sb2O3/SiO2 film in

set figure represents the Na+、K+ sensitivity and linearity for as-dep and annealed 500oC in O2 ambient. - 167 -Fig. 4-22 The different ion sensitivity of Sb2O3/SiO2sensing membrane annealed 500oC in O2 ambient and as-dep - 168 -Fig. 4-23 Enzyme immobilization steps - 169 -Fig. 4-24 pGlucose

-responses of enzyme- immobilized Sb2O3 (a) the sample for as-dep, (b) the film was annealed at 500oC in O2 ambient - 170 -Fig. 4-25 pGlucose-responses of enzyme- immobilized Sb2O3/SiO2 (a) the sample for as-dep, (b) the film was annealed at 500oC in O2 ambient - 171 -Fig. 4-26 pUrea-responses o

f enzyme- immobilized Sb2O3 (a) the sample for as-dep, (b) the film was annealed at 500oC in O2 ambient - 172 -Fig. 4-27 pUrea-responses of enzyme- immobilized Sb2O3/SiO2 (a) the sample for as-dep, (b) the film was annealed at 500oC in O2 ambient - 173 -Fig. 4-28 pCreatinine-responses of enzym

e- immobilized Sb2O3 (a) the sample for as-dep, (b) the film was annealed at 500oC in O2 ambient - 174 -Fig. 4-29 pCreatinine-responses of enzyme- immobilized Sb2O3/SiO2 (a) the sample for as-dep, (b) the film was annealed at 500oC in O2 ambient - 175 -