Aluminium的問題，透過圖書和論文來找解法和答案更準確安心。 我們找到下列問答集和資訊懶人包

Structural Materials for Sustainable Architecture: Imagining Delight, Form and Performance

為了解決Aluminium的問題，作者Dickson, Michael/ Walker, Peter 這樣論述：

This book discusses and illustrates the aesthetics, use and shaping of structural materials in the design and construction of a sustainable built environment. It develops the argument for, and an appreciation of, novel and innovative structural engineering forms through the comparative choice of

construction materials currently available for buildings. This includes well-established materials and technologies, such as masonry, timber, structural steel and concrete in its many forms, as well as re-emerging structural materials, including a range of natural materials as timber, hemp lime and

straw bales, as well as aluminium, glass, pre-stressed membranes, steel cables and nets. Beautifully designed with 250 full colour illustrations to accompany the text, the book aims to help its readers in creating a delightful, sustainable and effective architecture.

Aluminium進入發燒排行的影片

三相電磁噴流之研究

為了解決Aluminium的問題，作者鄭力瑋 這樣論述：

摘要電磁噴流是一種運用磁流體力學(Magnetohydrodynamics, MHD)之概念，當給予電極板電能與固定磁場時，便可產生勞倫茲力，藉此推動導電流體。其優點在於致動原理簡易，且不需要依靠複雜的機械結構，便可實現推送之效果。常見的應用在微尺度之微動幫浦與大型船體無槳式推進器上，以往許多研究都著重在電場與磁場之設計與幾何構型的最佳化，而本研究透過實驗探討在電磁噴流中，電極板附帶產生電化學反應而生成氣泡所構成之多相噴流場。並藉由染劑與氣泡之方式發展一流場可視化之方法。本研究透過計算染劑之汙染面積並與數值模擬結果進行比較，發現在低電流時之預測流量結果較為相近。並定義一無因次參數為勞倫茲力雷

諾數(Re_L)，用以描述電磁噴流之流場型態，實驗結果透過定性觀察當勞倫茲力雷諾數(Re_L)大於1600時，噴流型態會發展成紊流的型式。透過無因次分析結果也顯示其噴流擴散角(θ)與氣泡佔比(Ag)有隨Re_L數增加而有上升之趨勢，且在Re_L數大於1600後，因流場型態轉變，擴散角與氣泡佔比也有明顯上升之現象。在最後討論使用鋁電極板對於電磁噴流之影響。

Metal Matrix Composites: Fabrication, Production and 3D Printing

為了解決Aluminium的問題，作者 這樣論述：

Dr Suneev Anil Bansal has more than 15 years of diverse experience in industry, research laboratories and academia. He has served variuos key positions in key projects like automobile development at Hero Motor Corp., fighter aircraft development at DRDO, and nanomaterials & manufacturing development

at various universities. His research interest is in the fields of micro/nano-manufacturing, materials, 2D materials, graphene, polymer/metal composite materials, sensing, etc. Presently, he is working (& head of the nano/micro-manufacturing and materials research group) at Maharaja Agrasen Univers

ity. He has published more than 50 research papers, holds 1 patent and has served as a subject expert for a number of journalsDr. Virat Khanna is an Assistant Professor and Head in the Department of Mechanical Engineering at Maharaja Agrasen University, HP, India and has 11 years of teaching experie

nce. He is Ph.D. in Mechanical Engineering from Maharaja Agrasen University, HP, India. He Completed his M Tech in Mechanical Engineering in 2013 and B Tech in Mechanical Engineering in 2008 from I. K. Gujral Punjab Technical University, Jalandhar, India. His areas of research are Aluminium Metal ma

trix nanocomposite (Graphene, CNT, Processing technique, optimization and mathematical modeling techniques). He has published and presented more than 18 papers in Journals and conferences of national and international repute. He has authored one book named Steady State Creep in Rotating Thick-Walled

Composite Cylinders with Lambert Academic Publishing, Germany (ISBN: 978-3-659-71203-6). He is also the Editor of Book Emerging & Futuristic Trends in Engineering & Technology (ISBN: 978-93-82068-14-3).Dr. Pallav Gupta is presently working as an Assistant Professor (Grade-II) in the Department of M

echanical Engineering, Amity School of Engineering and Technology, Amity University Uttar Pradesh, Noida (INDIA). He completed his B.Tech. (Honors) from Department of Mechanical Engineering, Integral University, Lucknow, INDIA in the year 2009, Qualified GATE in 2009 with AIR-3291 and then completed

his M.Tech. (Honors) from I.I.T. (B.H.U.), Varanasi, INDIA in the year 2011 followed by Ph.D. in the year 2015 from I.I.T.(B.H.U.), Varanasi, INDIA. His area of research includes Material Processing; Metal Matrix Composites; Coatings/Nanocoatings; Mechanical Behaviour and Corrosion. He also has a g

ood command over teaching subjects like Material Science; Engineering Materials; Measurement and Metrology; Advanced Welding Technology & Composite Materials. Dr. Gupta has over 08 years of teaching and research experience. In this duration, he has published over 80+ research papers in peer reviewed

international journals as well as in reputed international and national conferences in India as well as in abroad. Apart from this he has also published 07 chapters in books published by Springer. Dr. Gupta has edited one book entitled Advances in Engineering Materials (Springer) and has also autho

red a textbook on Manufacturing Processes (IP Innovative Publication Pvt. Ltd.). He has also filed 01 Indian and 01 Australian Patent as well. Dr. Gupta has completed 02 sponsored research projects as Principal Invetigator. He also received International Travel Support from S.E.R.B., Department of S

cience and Technology, Government of India in the year 2016 for attending and presenting his research work in an International Conference held in Malaysia. Dr. Gupta also has memberships of several professional bodies like Materials Research Society of India, Tribology Society of India, Electron Mic

roscope Society of India, The Indian Society for Technical Education etc. He also has delivered large number of invited and expert lectures as well as chaired sessions in conferences at various reputed Universities and Institutes in India and Abroad. A large number of students have completed their S

ummer Internships, B.Tech. Projects and M.Tech. Dissertations under his guidance. 02 scholars have completed and 04 are presently registered for their Ph.D. research work under his Supervision in the area of Coatings, Metal Matrix Composites and Polymer Matrix Composites.

具有綠光雷射結晶多晶矽通道之T型閘薄膜電晶體射頻特性分析

為了解決Aluminium的問題，作者葉宇婕 這樣論述：

本論文中，我們研究具有T型閘極、空氣邊襯及矽化閘/源/汲極多晶矽薄膜電晶體的射頻特性。為了提升多晶矽薄膜的晶粒尺寸，我們使用綠光奈秒雷射來製備厚度為50 nm與100 nm的多晶矽薄膜。結果顯示厚度為100 nm的薄膜能得到等效尺寸大於1 μm的晶粒大小，遠優於50 nm厚的多晶矽薄膜。我們於元件製作時採用了新穎的T型閘極技術，不僅降低元件的閘極電阻，也使電晶體具有比微影技術解析極限更小的閘極線寬，使轉導得以大幅提升。我們也分別利用高溫的快速熱退火及低溫的微波退火來活化源汲極雜質。在通道厚度為100 nm並以快速熱退火進行源汲極活化的多晶矽薄膜電晶體中，對最小通道長度達124 nm之元件，截

止頻率可達59.7 GHz，最大震盪頻率亦可達34 GHz。具有相同通道厚度並以微波退火來活化雜質的電晶體中，當通道長度微縮至102 nm，元件的截止頻率更高達63.6 GHz，最大震盪頻率亦可達29.7 GHz。相較過往文獻報導的多晶矽薄膜元件，我們以微波活化源汲極的薄膜電晶體達到了最高的截止頻率。